abstract |
An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1.n nin Formula 1, R is C 4 ~C 20 mono-cyclic or multi-cyclic saturated hydrocarbon, R 1 is C 1 ∼C 10 linear hydrocarbon, C 1 ~C 10 perfluoro compound or C 5~ C 20 aromatic compound, R a and R b are independently hydrogen atom or C 1 ~C 4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S). |