http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1999515-A2

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filingDate 2007-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6896c2fb0a8d08d7ca9f1d47a27fb92c
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publicationDate 2008-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1999515-A2
titleOfInvention Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process
abstract Processes for monitoring the levels of oxygen and/or nitrogen in a substantially oxygen and nitrogen-free plasma ashing process generally includes monitoring the plasma using optical emission. An effect produced by the low levels of oxygen and/or nitrogen species present on other species generally abundant in the plasma is monitored and correlated to amounts of oxygen and nitrogen present in the plasma. This so-called 'effect detection' process monitors perturbations in the spectra specifically associated with species other than nitrogen and/or oxygen due to the presence of trace amounts of oxygen and/or nitrogen species and is used to quantitatively determine the amount of oxygen and/or nitrogen at a sensitivity on the order of 1 part per million and potentially 1part per billion.
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