http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1962337-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-065 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31695 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-482 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-26 |
| filingDate | 2008-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_393209989cfab7baa7bcdb4b8b9404a5 |
| publicationDate | 2008-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1962337-A2 |
| titleOfInvention | Method of preparing a dielectric material with oriented porosity on a substrate by electromagnetic and/or photonic treatment |
| abstract | The invention relates to a method of manufacturing a porous dielectric material oriented on a substrate comprising:na) the vapor deposition on a substrate of a composite layer comprising a matrix-forming material and a compound comprising chemical groups capable of orienting itself under the effect of an electromagnetic field and / or radiation photonics;nb) treating the composite layer to crosslink the matrix material;nsaid method further comprising a step c) of subjecting said substrate coated with said composite layer to an electromagnetic field and / or photon radiation, said step c) being performed simultaneously in step a), when subjecting said layer to photonic radiation or being carried out before and / or simultaneously with step b), when said layer is subjected to an electromagnetic field, knowing that the electromagnetic field is applied in contact with the substrate, this step c) being performed so as to align in a predetermined direction the chemical groups mentioned in step a). Application to the field of microelectronics, separating membranes, diffusion membranes, molecular detectors, optical materials, polymer masks. |
| priorityDate | 2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 113.