| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_27562ace359200dce7274340b5c7c28b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R31-31718
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8854
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R31-31718
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F16-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-00 |
| filingDate |
2006-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1e7e104bb4257ecc047813280174d78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b1cdfc2ba45414c5ade9334f49fbf50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9d93ab0de6304403285decb529ecf88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f3cd6c87c3d7ed82fd42cc11ab7c8a3 |
| publicationDate |
2008-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1955225-A2 |
| titleOfInvention |
Methods and systems for utilizing design data in combination with inspection data |
| abstract |
Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for determining a position of inspection data in design data space includes aligning data acquired by an inspection system for alignment sites on a wafer with data for predetermined alignment sites. The method also includes determining positions of the alignment sites on the wafer in design data space based on positions of the predetermined alignment sites in the design data space. In addition, the method includes determining a position of inspection data acquired for the wafer by the inspection system in the design data space based on the positions of the alignment sites on the wafer in the design data space. In one embodiment, the position of the inspection data is determined with sub-pixel accuracy. |
| priorityDate |
2005-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |