| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3773
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D9-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 |
| filingDate |
2006-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_408c5c237358db939f26cc511c4b1005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c336a14cb9352644f0845d38a9dc50a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b425676efe1d26c12ce5a315f5de32b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03ffc2e8efc27f724b66610c032a369b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e51b2cf8b92e59b77666907dc70bab1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0348c10f46675dffacf676d198086be |
| publicationDate |
2008-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1945748-A2 |
| titleOfInvention |
Metals compatible photoresist and/or sacrificial antireflective coating removal composition |
| abstract |
A liquid removal composition and process for removing photoresist and/or sacrificial anti-reflective coating (SARC) material from a microelectronic device having same thereon. The liquid removal composition includes at least one organic quaternary base and at least one surface interaction enhancing additive. The composition achieves at least partial removal of photoresist and/or SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the microelectronic device, such as copper and cobalt, and without damage to low-k dielectric materials employed in the microelectronic device architecture. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102634809-A |
| priorityDate |
2005-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |