http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1944347-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6763ac2fdc0b41854ea3367ad927e7c7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-06 |
| filingDate | 2006-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f99f08db71582d0c7c4e3eed5be74c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3441bf12eff0f7ce60e0ecf4421860e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3dd3ab545ea26d8ecb3eb4896304d9f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_071f65e102d16fcf97ed299963fd009e |
| publicationDate | 2008-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1944347-A1 |
| titleOfInvention | Abrasive material and process for producing the same |
| abstract | Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30nm or more and 500nm or less, and their average diameter is in the range of 30nm or more and 200nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted. |
| priorityDate | 2005-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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