http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1933364-A2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0206
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
filingDate 2007-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3c82e3f4d78bb8c13374776fe70288d
publicationDate 2008-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1933364-A2
titleOfInvention Method and apparatus for preventing arcing at ports exposed to a plasma in plasma processing chambers
abstract A method and apparatus for preventing arcing at a port exposed to a plasma in a plasma chamber use circuit components causing a door sealing the port to provide a short circuit path at excitation frequency of the plasma. In one embodiment, the door is a slit valve door sealing a substrate transfer port of an etch chamber.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111213221-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111213221-A
priorityDate 2006-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6337598

Total number of triples: 18.