Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d3082cd39bb800686b9abbb8aa05c80b |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H5-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-02 |
filingDate |
2006-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_086a9f7c640861abaca13d823d5fef86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18b9bd0e965b4441f4ff12086c1a0337 |
publicationDate |
2008-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1920089-A2 |
titleOfInvention |
Controlled electrochemical polishing method |
abstract |
The invention relates to a method of polishing a substrate comprising at least one metal layer by applying an electrochemical potential between the substrate and at least one electrode in contact with a polishing composition comprising a reducing agent or an oxidizing agent. |
priorityDate |
2005-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |