| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate |
2007-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_549791bc11f6de52f7a90c1de8f7408d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ea3528bea2ece87c4d6851fb7abdccd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7f92babb0f9c38eef9843205cd3f751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6557df5a6edf836edcc43a70d2bdaf76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31d42e62a0c122bf9152f9dd56c17e33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d73fddeb26fc0eb13bbd594190fec5ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7552de653a73f7869dbf84c9976f8c5b |
| publicationDate |
2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1918971-B1 |
| titleOfInvention |
Method and apparatus for photomask plasma etching |
| priorityDate |
2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |