| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60480587582bf8e0ca64c6076c0646ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31744
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31732
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3056 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08 |
| filingDate |
2007-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71addffbe0a4cb8b78c58a229dd14743
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da6a66233b091672cce837f547611ad7 |
| publicationDate |
2008-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1918963-A2 |
| titleOfInvention |
Charged particle beam processing using a cluster source |
| abstract |
A cluster source producing a beam of charged clusters 108 is used to assist charged particle beam processing on a work piece 112. For example, a protective layer is applied using a cluster source and a precursor gas, the gas being supplied by a gas injection system 104. The large mass of the cluster and the low energy per atom or molecule in the cluster restricts damage to within a few nanometers of the surface of the work piece. Fullerenes or clusters of fullerenes, bismuth, gold or Xe can be used with a precursor gas to deposit material onto a surface, or can be used with an etchant gas to etch the surface. Clusters can also be used to deposit material directly onto the surface to form a protective layer for charged particle beam processing or to provide energy to activate an etchant gas. An additional charged particle beam 107 can assist in machining the work piece when e.g. a protective layer is applied. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7982196-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8877299-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113403572-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010117551-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8481340-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2899742-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2602808-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8592784-B2 |
| priorityDate |
2006-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |