http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1918775-A2
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-08 |
filingDate | 2007-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d2cc03259fd0ef1cbe1501931911114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7f92babb0f9c38eef9843205cd3f751 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13b1d3e9391eeb2da78ba93f5bbb1f36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac79c229a332ed9dba8cac9041d70d0e |
publicationDate | 2008-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-1918775-A2 |
titleOfInvention | Mask etch process |
abstract | Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate (122) having a metal photomask layer (320) disposed on a optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, at least one of trifluoromethane (CHF 3 ), sulfur hexafluoride (SF 6 ), hexafluoroethane (C 2 F 6 ) or ammonia (NH 3 ) and optionally a chlorine-free halogen containing gas and/or an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate. |
priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 64.