| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate |
2006-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71505cefe46abfea8896ecff709fde26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f7cc3fbc8923eb31e70223513c51114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70e3c45cb3bf7154bf486c00d2a138e7 |
| publicationDate |
2008-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1904413-A1 |
| titleOfInvention |
Printable etching media for silicon dioxide and silicon nitride layers |
| abstract |
The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for etching surfaces in the production of solar cells, and also to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for etching inorganic layers and for doping underlying layers. In particular, corresponding particle-containing compositions are involved which can be used to etch extremely fine structures very selectively without damaging or attacking adjoining areas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102449112-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102449112-B |
| priorityDate |
2005-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |