| abstract |
The present invention provides a production method for a color filter including forming a first colored layer (2) on a support (1), forming a photoresist layer (3) on the first colored layer (2), forming an image (4) on the first colored layer (2) by removing the photoresist layer (3) in the form of an image pattern (4), etching the first colored layer (2) in the form of the image (4) formed in the photoresist layer (3) by use of a dry etching process that uses a mixed gas in which a fluorine-based gas and oxygen (O 2 ) are mixed at a mixing ratio (fluorine-based gas/O 2 ), by flow rate ratio, in the range of from 2/1 to 8/1, and removing the photoresist layer (3) remaining after the etching. |