http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1880412-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-013 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70383 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1258 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-04 |
| filingDate | 2006-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18eb4ec1f305bcaf96f6003484490d98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2db7ef820d71c3f2c0be05d7ce61189f |
| publicationDate | 2008-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1880412-A1 |
| titleOfInvention | Method for forming high-resolution pattern with direct writing means |
| abstract | Disclosed is a method for forming a pattern which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line; (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. A substrate having a pre-pattern formed by the method is also disclosed. The method for forming a pattern provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method includes use of the first means with a high resolution, such as focused energy beams of laser, combined with the second means with a low resolution, such as ink-jet, and provides a high-resolution pattern with high processing efficiency. |
| priorityDate | 2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 292.