http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1875507-A2

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823878
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1203
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1207
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
filingDate 2006-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ec51cea5cdf0a5040d7a56c03d0c071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ca057efe5ad5c8a5281a6d2e2641603
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publicationDate 2008-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1875507-A2
titleOfInvention Hybrid crystal orientation cmos structure for adaptive well biasing and for power and performance enhancement
abstract The present invention provides a semiconducting structure including a substrate having an SOI region and a bulk-Si region, wherein the SOI region and the bulk-Si region have a same or differing crystallographic orientation; an isolation region separating the SOI region from the bulk-Si region; and at least one first device located in the SOI region and at least one second device located in the bulk-Si region. The SOI region has an silicon layer atop an insulating layer. The bulk-Si region further comprises a well region underlying the second device and a contact to the well region, wherein the contact stabilizes floating body effects. The well contact is also used to control the threshold voltages of the FETs in the bulk-Si region to optimized the power and performance of circuits built from the combination of the SOI and bulk-Si region FETs.
priorityDate 2005-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 21.