| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2001-105 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-2205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4402 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2007-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4725831fc45cf23018fdf2d012ca7ed6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_414f123a58a75b03143bec7a998c0456
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c67c447909be2ce648993decbc435d90 |
| publicationDate |
2007-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1854906-A2 |
| titleOfInvention |
Analysis of a reactive gas such as silane for particle generating impurities |
| abstract |
A process, for supplying to a processing tool such as a chemical vapor deposition device a gas that may contain an impurity that reacts and/or nucleates to form contaminating particles suspended in the gas, comprises sampling a flow (25) of the gas upstream of the processing apparatus with a particle counter (50) and/or particle capture filter (60) to detect an amount of the contaminating particles in the flow of the gas, and generating a signal when the amount of particles is in excess of a predetermined amount. The process may, in particular, be an integrated circuit manufacturing process, wherein the gas is silane. |
| priorityDate |
2006-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |