http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1850362-A3
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2201-30446 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J31-127 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-30 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J31-12 |
filingDate | 2007-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e066e0417bf859d542b867a5a9ba169b |
publicationDate | 2007-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-1850362-A3 |
titleOfInvention | Electron emission source, composition for forming the electron emission source, method of forming the electron emission source and electron emission device including the electron emission source |
abstract | An electron emission source includes a carbon-based material and a resultant material formed by curing and heat treating at least one silicon-based material represented by formula (1), (2), and/or (3) below:n n n nwhere R 1 through R 22 are each independently a substituted or unsubstituted C 1 -C 20 alkyl group, a substituted or unsubstituted C 1 -C 20 alkoxy group, a substituted or unsubstituted C 1 -C 20 alkenyl group, a halogen atom, a hydroxyl group or a mercapto group, and m and n are each integers from 0 to 1,000. An electron emission device and an electron emission display device include the electron emission source. A composition for forming electron emission sources includes the carbon-based material and the silicon-based material. A method of forming the electron emission source includes applying the composition to a substrate; and heat treating the applied composition. The adhesion between the electron emission source including the cured and heat treated resultant material of the silicon-based material and a substrate is excellent, and thus the reliability of the electron emission device including the cured and heat treated resultant material of the silicon-based material can be enhanced. |
priorityDate | 2006-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.