http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1849042-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_32d44892f356d4ab6ffffd839a5581ca |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2006-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b608741062c464073ffc80af8f8dc5fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6077d2e35779cbfe69d4dca4259943c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4daf554e5c6281730951a90f09e1ab99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9a547466d772bf9645b1071879988ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6fe205afdc573eac3b6d7b00fdddc7e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5f4b984cf30a3277a1eb19b9954c8b1 |
| publicationDate | 2007-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1849042-A2 |
| titleOfInvention | Process for the production of lithographic printing plates |
| abstract | Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (ii) at least one sensitizer which in the presence of at least one coinitiator and upon exposure to radiation of a wavelength of 300 to <480 nni or >750 to 1,100 nm initiates the free-radical polymerization of component (i); and (iii) at least one binder with acidic functional groups and is substantially not sensitive to the wavelength range of 480 to 750 nm; (c) image-wise exposure of the resulting negative working lithographic printing plate precursor to radiation selected from the wavelength range of 300 to <480 nm or >750 to 1,100 nm depending on the sensitizer or initiator system used; and (d) removing the non-irradiated areas by means of a treatment with an alkaline developer with a pH value in the range of 9 to 14 comprising (i) water, (ii) one or more alkali hydroxides in an amount sufficient for adjusting a pH value in the range of 9 to 14; and (iii) 1 to 30 wt. -% of at least one compound of formula (I) wherein R1, R2, R3 and R4 are each independently selected from C1-C12 alkyl groups and aryl groups, X is selected from -CH=CH-, -C≡C-,formula (II), formula (III), and formula (IV), n + m results in a value of 2 to 30 and p + q results in a value of 0 to 30, wherein in the case of p + q ≠ 0 the ethylene oxide and propylene oxide units are present as blocks or randomly distributed. |
| priorityDate | 2005-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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