http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1834925-A1

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filingDate 2005-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4565b60053d91a01dfdc8fc18970c83
publicationDate 2007-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1834925-A1
titleOfInvention Apparatus for manufacturing carbon film by plasma cvd, method for manufacturing the same, and carbon film
abstract Provided is a method for uniformly producing a carbon film at a low cost with low power consumption. The method for producing a carbon film, including: a step of disposing a cylindrical member having an opening in part thereof in a vacuum chamber; na step of disposing a substrate inside the cylindrical member; a step of introducing a gas for carbon film production into the vacuum chamber; and a step of applying a voltage for plasma generation to the cylindrical member to thereby generate a plasma in the cylindrical member and to produce the carbon film on the surface of the substrate by the plasma.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2482304-A1
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priorityDate 2005-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.