Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ac840dce616e97d42b70e59e8da8d09 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-06 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-08 |
filingDate |
2005-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_608c42dace9e4a746b5418d16dcc35b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ebbce638125cff6698e37ff72ae51a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee86f7dfdbd349ba8725d586c479c2e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80060f5e3fbae16a6e9949905cdc0155 |
publicationDate |
2008-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1819752-A4 |
titleOfInvention |
PROCESS FOR HIGH-PURITY, MULTIPLE, OLIGOMER SILSESQUIOXANMONOMERE |
abstract |
A synthesis process for polyhedral oligomeric silsesquioxanes that produces in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic applications. POSS silanols are reacted with a silane coupling agent in the presence of a solvent and a superbase. |
priorityDate |
2004-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |