http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1789849-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fcaed31afee960c63f0d21e133fab13 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2005-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bfb3924e9dc16db58c8db75ca92c6d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f4a9225edbe48a494ee87d104fe1310 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d539c457361aeff6e6516b072bdfea37 |
| publicationDate | 2007-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1789849-A2 |
| titleOfInvention | Use of methanofullerene derivatives as resist materials and method for forming a resist layer |
| abstract | The present invention relates in one aspect to the use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by the formula C2x(CR1R2)m where x is at least (10), m is at least (2), each addend represented by CR1R2 is the same or different, and wherein each R1 and R2 is each a monovalent organic group, or a divalent organic group which forms a ring structure by being joined to the fullerene shell, or where both R1 and R2 of an addend are divalent groups, they may be mutually joined to form a ring structure, save that at least two of R1 or two of R2 are monovalent, or a mixture of such derivatives. The invention also resides in the use of any methanofullerene derivative which has been chemically amplified for formation of a patterned resist layer. The essential step of the method is forming a coating layer comprising the methanofullerene derivative on the substrate surface, the methanofullerene derivative being chemically amplified by including in the coating layer at least one additional component which increases the sensitivity of the exposed layer to actinic radiation which is subsequently used to pattern the layer. |
| priorityDate | 2004-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 119.