| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_54b2683b98d72a1421850c0cf08d3405 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-36 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B55-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-00 |
| filingDate |
2006-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83d6602e5ea4ddeaaec93f9a087adab2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e530c7c9183b6e9a6612d7804b87d4e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84afb18dff734e2ed030481c3e365179
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a3806972943c5e5ee3c4833fbc50694
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7ddb5b0a467fbff9826b5d183f93614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8f918283b9684a4b5207629223dd33d |
| publicationDate |
2007-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1785228-A1 |
| titleOfInvention |
Apparatus and method for polishing work using electrolytic reduced water |
| abstract |
The method of polishing a work (W) is capable of reducing a polishing cost, polishing a surface of the work (W) with high polishing accuracy and easy disposal of used polishing liquid and used washing liquid. The method comprises the steps of: pressing the work (W) onto a polishing member (12); feeding polishing liquid; and relatively moving the work (W) with respect to the polishing member (12). Electrolytic reduced water produced by electrolyzing an electrolyte solution is used as the polishing liquid. |
| priorityDate |
2005-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |