| abstract |
Provided are a sputtering target comprised of Y 2 O 3 , Al 2 O 3 and SiO 2 , and an optical information recording medium and a manufacturing method thereof, wherein the optical information recording medium is formed in a part of an optical information recording medium structure at least as a thin film by using the sputtering target, and is disposed adjacent to a recording layer or a reflective layer. The present invention relates to a thin film for an optical information recording medium (especially used as a protective film) that has stable film amorphous nature, is superior in adhesiveness and mechanical properties with the recording layer, has a high transmission factor, and is composed with a non-sulfide system, whereby the deterioration of the adjacent reflective layer and recording layer can be suppressed. The present invention also provides a manufacturing method of such a thin film, and a sputtering target for use therein. As a result, the present invention is able to improve the performance of the optical information recording medium, and to considerably improve the productivity thereof. |