Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-0118 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-0015 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00404 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
filingDate |
2006-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93019fb63551ffd28d085a735ed9ca45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4d69424e1f0fba17c5cd555a6046ac5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d94822afde909fa644d516b40386323e |
publicationDate |
2007-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1752415-A2 |
titleOfInvention |
Manufacturing method of a suspended MEMS structure |
abstract |
To provide a method of easily forming a three-dimensional structure typified by a cantilever by using a thin film formed over an insulating surface, and provide a microelectromechanical system formed by such a method. A three-dimensional structure typified by a cantilever is formed by using a mask having a nonuniform thickness. Specifically, a microstructure is manufactured by processing a structural layer formed over a sacrificial layer by using a mask having a nonuniform thickness and then removing the sacrificial layer. The sacrificial layer can be formed by using a silicon layer or a metal layer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11631928-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9656859-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103569951-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022131247-A1 |
priorityDate |
2005-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |