| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a16e2fa556744225f7c2bba36087e7f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2005-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60718ba155cf9daa67de795881b214a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf0c8583f6813e73a4e8a859f02353fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c75b5fb10d447b0259f69e8cffcff27d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e143d455a6823fe7e5ad0022e6311b99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d249d60efb65be301c7314c66d5b971f |
| publicationDate |
2007-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1744213-A1 |
| titleOfInvention |
Positive photosensitive resin composition, method for forming pattern, and electronic component |
| abstract |
Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than 280°C, as well as low water absorption and capability to give a pattern with favorable configuration. The positive photosensitive resin composition contains: (a) alkaline aqueous solution-soluble polyamide having a polyoxazole precursor structure; (b) an o-quinonediazide compound; and (c) a latent acid generator which generates acid upon heating. The composition optionally further contains (d) a compound having a phenolic hydroxyl group or (e) a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7615324-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2113810-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1970761-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2113810-A4 |
| priorityDate |
2004-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |