http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1743217-A2

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filingDate 2004-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2007-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1743217-A2
titleOfInvention Method for imprint lithography at constant temperature
abstract Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and - postbaking the layer.
priorityDate 2004-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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