| abstract |
Provided are a sputtering target comprising a compound oxide of HfO 2 and Y 2 O 3 ; the foregoing sputtering target wherein the Y 2 O 3 content is 10 to 95 mol% and the remnant is HfO 2 ; and the foregoing sputtering target further containing 10 to 90 mol% of ZrO 2 . The present invention also provides a thin film for an optical information recording medium (especially used as a protective film) that has stable film amorphous nature, is superior in adhesiveness and mechanical properties with the recording layer, has a high transmission factor, and is composed with a non-sulfide system, whereby the deterioration of the adjacent reflective layer and recording layer can be suppressed. The present invention also provides a manufacturing method of such a thin film, and a sputtering target for use therein. As a result, the present invention is able to improve the performance of the optical information recording medium, and to considerably improve the productivity thereof. |