Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5e4671b3ba1fd59502c47747a80896 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28587 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0272 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2005-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab30123a0317ba6dfd1f7646247e6d4f |
publicationDate |
2006-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1719157-A2 |
titleOfInvention |
Device manufacturing method and substrate comprising radiation sensitive material |
abstract |
A method of producing a T-gate in a single stage exposure process using electromagnetic radiation is disclosed. |
priorityDate |
2004-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |