http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1719157-A2

Outgoing Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0272
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
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filingDate 2005-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab30123a0317ba6dfd1f7646247e6d4f
publicationDate 2006-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1719157-A2
titleOfInvention Device manufacturing method and substrate comprising radiation sensitive material
abstract A method of producing a T-gate in a single stage exposure process using electromagnetic radiation is disclosed.
priorityDate 2004-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 20.