| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c4b5184b7a8fe02a0c2cc4e509230214 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-22 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D13-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00 |
| filingDate |
2005-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8dcff424eff985c3b03ae42bacb7e3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b0ebe3e4db2d328d18dbd068853d100
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82774c74a14e8fb82f8e6815c4aa1746
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f985c8794fbc5c3277845c14925dbaf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_640b6337f876d0a86b1a6a0d4d3e6e21 |
| publicationDate |
2011-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1715980-B1 |
| titleOfInvention |
Base pad polishing pad and multi-layer pad comprising the same |
| abstract |
Disclosed is a base pad of polishing pad, which is used in conjunction with polishing slurry during a chemical-mechanical polishing or planarizing process, and a multilayer pad using the same. Since the base pad according to the present invention does not have fine pores, it is possible to prevent premeation of polishing slurry and water and to avoid nonuniformity of physical properties. Therby, it is possible to lengthen the lifetime of the polishing pad. |
| priorityDate |
2004-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |