| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2006-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fda7be584c5a6af07c427bf31a3b0686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4851e387714421b7078086c4076be866 |
| publicationDate |
2006-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1698936-A2 |
| titleOfInvention |
Negative-type photosensitive resin compositions |
| abstract |
Provided are negative-type photosensitive resin compositions which may be used as interlayer insulating layers on a silicon wafer. The compositions include a urea crosslinking agent together with an epoxy-containing material and vinylphenol resin. Also provided are methods of forming patterned insulating layers using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111164512-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2292707-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2292707-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8791173-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3121651-A4 |
| priorityDate |
2005-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |