http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1698935-A3

Outgoing Links

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filingDate 2006-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2008-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1698935-A3
titleOfInvention Negative-type photosensitive resin composition
abstract Provided are negative-type photosensitive resin compositions which may be used in forming interlayer insulating layers on a silicon wafer or printed wiring board. The compositions include a vinylphenol resin, a biphenyl-phenol resin and epoxy-containing materials. Also provided are methods of forming patterned dielectric films using such compositions. The resin compositions can be used in the manufacture of wafer-level chip-scale packages and LSIs, for example, as interlayer insulating layers.
priorityDate 2005-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.