http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1632520-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-73 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01D5-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G85-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 |
| filingDate | 2004-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63f2997b9b46518a68363c606a60125c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7048b37d7dbaab5ce62f734233939fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d39aad42dc4a9b960224f0f9972ce50 |
| publicationDate | 2006-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1632520-A1 |
| titleOfInvention | Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material |
| abstract | The present invention relates to a film forming, photoactive material comprising a complex prepared from (a) at least one ionic photosensitive compound which may undergo a photoreaction, selected from photoisomerizations, photocycloadditions and photoinduced rearrangements, wherein the photosensitive compound is of formula I or formula II n [R-P-R'] n+ n/x A x- (I) nor n n/x A x+ [R-P-R'] n- (II) nwherein P is a group capable of photoisomerization, and R and R' are independently selected from optionally substituted or functionalised aryl-containing groups at least one of which is positively or negatively charged, A is an oppositely charged cation or anion, n is an integer, and x is 1, 2 or 3, and/or the photosensitive compound is of formula III or IV: n [R 1 -Q-R 1' ] n+ n/x A x- (III) nor n n/x A x+ [R 1 -Q-R 1' ] n- (IV) nwherein Q is a group capable of participating in a photocycloaddition or photoinduced rearrangement reaction, and R 1 and R 1' are independently selected from optionally substituted or functionalized groups having electron-accepting properties and optionally substituted or functionalized aryl-containing groups and from such groups which together with Q form an aryl ring or heteroaryl ring, wherein either at least one of R 1 and R 1' is positively or negatively charged or the ring structure and/or a substituent thereon will carry at least one positive or negative charge, wherein A, n and x are defined as for formulae I and II, with the proviso that in all compounds of formulae (I) to (IV) contained in one complex, the charge of [R-P-R'] and/or [R 1 -Q-R 1' ] has the same sign, and (b) at least one polyelectrolyte carrying charges which are opposite to those of the active groups [R-P-R'] and/or [R 1 -Q-R 1' ] of the photosensitive material. If films prepared from this material are homogeneously or heterogeneously irradiated with polarized light, optical anisotropy and/or a surface relief structure may be reversibly or irreversibly induced in/on the films, depending on specific parameters detailed in the specification. |
| priorityDate | 2004-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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