| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6e3134a8c086008af6ff6aa6020dd74a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2203-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0466
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D2518-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C22-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C22-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2004-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f97a016a891c3fe88cfae31b4a1209a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b0fc344f537e69f68a14d4b1456f756 |
| publicationDate |
2006-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1623454-A2 |
| titleOfInvention |
Reactor surface passivation through chemical deactivation |
| abstract |
Protective layers (208) are formed on a surface (201) of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor (100). Parts defining a reaction space (200) for an ALD or CVD reactor (100) can be treated, in situ or ex situ, with chemicals (206) that deactivate reactive sites (210) on the reaction space surface(s) (201). A pre-treatment step (502) can maximize the available reactive sites (210) prior to the treatment step (504). With reactive sites (210) deactivated by adsorbed treatment reactant (208), during subsequent processing the reactant gases (214) have reduced reactivity or deposition upon these treated surfaces. Accordingly, purge steps (310, 314) can be greatly shortened and a greater number of runs can be conducted between cleaning steps to remove built-up deposition on the reactor walls. |
| priorityDate |
2003-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |