http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1602010-A2
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
filingDate | 2004-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c6b1f8c0129e7e23d513f517b279f58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da8591dcb333ecbaf2ce4fe384854192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfe25c9354f65b1f094b68db2fc948b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b31e13e6b990a432c2d7f6a4275b5aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add23135f1e5cfd4c9f0de95dc3cb70f |
publicationDate | 2005-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-1602010-A2 |
titleOfInvention | Photosensitive composition and use thereof |
abstract | A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate. |
priorityDate | 2003-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 665.