| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22691f78e0679dc391e7172ba32d0b66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5ef344c3f79cca4d65d00cf8ca1726c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7c9f34de12969c5f3eca8e5864a066f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8edef8f41e25d19f9d1a4a060f7d5f73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f9dc21e323a7963e080620c3d6a0fc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c048878a44801eed128dcd6f0bfccff3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcd7302d9f9b908ff454e603e14df9dc |
| publicationDate |
2010-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1586005-B1 |
| titleOfInvention |
High sensitivity resist compositions for electron-based lithography |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8906591-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8883395-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871429-B2 |
| priorityDate |
2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |