| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01e48e78fadaaec045333f9ad5a6e0b5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-136 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D101-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D129-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2003-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99e9d104de7e8fecd3ef2339a246c40a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f28250cb96dd4d50ae1cf290b2e1e529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8baf11746b4496ff6ad1981cbed97c48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f58dfd1963fcfe10fa9ee11f3b303ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fd393a67caeef79c90a884f2b33f95e |
| publicationDate |
2005-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1554322-A4 |
| titleOfInvention |
ANTIREFLECTION LAYERS AND DOUBLE DAMASCINING FILLING COMPOSITIONS CONTAINING ALLYL STYRENE ALCOHOL COPOLYMERS |
| abstract |
New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing. |
| priorityDate |
2002-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |