http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1520693-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24372 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-25 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44C5-0476 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B3-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C5-04 |
| filingDate | 2003-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_804cd399b776771981547ba4fc12b224 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa263cad7655f63b2ab777558ded538c |
| publicationDate | 2005-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1520693-A1 |
| titleOfInvention | Decorative material and decorative sheet |
| abstract | An object of the present invention is to realize anconfiguration of decorative sheet, particularly a decorativenpaper and the like, or a decorative material in which it is adhered,nin which: grain depression is not visible; scratch resistancenand contamination resistance are excellent; andnthree-dimensional design can be expressed, at low cost. n For attaining the above-mentioned object, the presentninvention uses a delustering silica, whose surface is treatednwith a fatty acid based wax such as stearic acid, as a delusteringnsilica in a decorative material 10 in which a luster adjustingnresin layer 2, which is formed of a cross-linked cured materialnof an ionizing radiation curing resin composition containingna delustering silica, is provided on a base material 1. Thenluster adjusting resin layer may be formed with an even thickness. n However, a convex-concave surface design can be expressed bynforming the luster adjusting resin layer partially in a pattern. n The luster adjusting resin layer is formed with an ionizingnradiation curing resin composition, particularly with no solvent,nby a gravure printing or gravure coating using a doctor bladenand a gravure plate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022034546-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IT-202000020143-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IT-RN20120015-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013055757-A1 |
| priorityDate | 2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 115.