| abstract |
A composition containing a photoacid generator monomer and surfactant, andna method for synthesizing a compound on a substrate using the composition arenprovided. The method includes bonding a layer of first molecules having an acidnlabile protecting group to a solid substrate; coating a layer of the photoacid generatornmonomer composition according to the present invention on the layer of firstnmolecules; exposing the composition layer to light and then heat-treating to removenthe acid labile protecting group from the first molecules corresponding to thenexposed portion; washing and removing the composition layer from the exposed andnunexposed portions; and bonding second molecules to the exposed first molecules. |