| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2004-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cecbcd93ba822fd459dfe9415b10b8d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_278135abcea06da9bc7ccfbae4bddad6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7 |
| publicationDate |
2004-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1491951-A2 |
| titleOfInvention |
Positive-working resist composition |
| abstract |
A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35°C or more or a boiling point of 100°C/10 mmHg or more:n n and (D) a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1837706-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1566693-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1566693-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7611819-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7326516-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7749678-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101833243-B |
| priorityDate |
2003-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |