http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1488483-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d54adcccfe94ca903946779172afb5d6 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01S3-08059 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B26-001 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B26-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J3-26 |
| filingDate | 2003-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be60191bfa430a01b86e9f2c18b19727 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c36e0bf51997af1db5efd80fdaed73c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9794941dbfa1fabbbde487210a386cd9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97d022d6d9c8fc96b3dd00d5a41ba382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe292076e507a4c38fe62fbcb9e73b7f |
| publicationDate | 2004-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1488483-A1 |
| titleOfInvention | Tunable cavity resonator and method of fabricating same |
| abstract | A tunable cavity resonator (11, 65) for filtering radiation in the optical and IR wavelengths and a method for fabricating same. The resonator (11, 65) having a pair of reflectors (15, 19), one (15) in fixed relationship to a substrate (27, 77) and the other (19) formed upon a suspended moveable membrane (17) disposed a cavity length (d) from the one reflector (15). The resonator (11, 65) also including a pair of spaced apart electrodes either constituted by the reflectors (15, 19) or juxtaposed therewith, which are electrostatically operable to move the membrane (17) and other reflector (19) relative to the one reflector (15). A first reflector layer is deposited on the substrate (27) to form the one reflector (15). A sacrificial layer (75) having a high etch selectivity for releasing the membrane (17, 77) in a suspended and spaced relationship from the one reflector (15) is formed on the first reflector layer. The membrane (17, 77) is deposited on the sacrificial layer (75) using a deposition technique characterised by providing the required intrinsic stress in the membrane (17, 77). A second reflector layer is formed on the membrane (17, 77) to form the other reflector (19). The second reflector layer is patterned in accordance with a prescribed membrane geometry and then etched to achieve the same. The sacrificial layer (75) is then initially etched to remove regions thereof down to the first reflector layer on the substrate (27) exposed by the etching. Those regions of the sacrificial layer that are intended to function as the residual support structure of the membrane (17, 77) are then protected with photoresist and the remaining unprotected regions of the sacrificial layer are finally etched, removing the protection from the support structures to suspend the membrane (17, 77) in substantially parallel relation to the first reflector layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115452215-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115452215-B |
| priorityDate | 2002-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.