| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63F9-0098 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G09B19-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-342
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G09B19-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D13-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 |
| filingDate |
2004-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2901aa968cc1ca9aaed09dc41ba7e98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56001f6a1048383fd633d33d2ecd3cc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00766a0cfe666d98f6d737ac6751bb3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c65008a35ba521f72a4ce5dfc860bb8 |
| publicationDate |
2004-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1468785-A2 |
| titleOfInvention |
Polishing pad and production method thereof |
| abstract |
There are provided a polishing pad which exhibitsnexcellent polishing stability and excellent slurrynretainability during polishing and even after dressing, cannprevent a reduction in polishing rate effectively and is alsonexcellent in an ability to flatten an substrate to be polished,nand a method for producing the polishing pad. The methodncomprises dispersing water-soluble particles such asnĪ²-cyclodextrin into a crosslinking agent such as anpolypropylene glycol so as to obtain a dispersion, mixingnthe dispersion with a polyisocyanate such asn4,4'-diphenylmethane diisocyanate and/or an isocyanatenterminated urethane prepolymer, and reacting the mixednsolution so as to obtain a polishing pad having thenwater-soluble particles dispersed in the matrix. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2242615-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2242615-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7097550-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1600260-A1 |
| priorityDate |
2003-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |