| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G07C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06Q10-1091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B5-1172
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C395-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0827
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C391-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06V20-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06Q10-063116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C391-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C395-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 |
| filingDate |
2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e11c15768bfd9298eafaf1cb6733d05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0c04cc57096a70e5a0bfea4d58ad8d9 |
| publicationDate |
2007-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1464724-A3 |
| titleOfInvention |
Organometallic compounds suitable for use in vapor deposition processes |
| abstract |
Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices. |
| priorityDate |
2003-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |