| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-505 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 |
| filingDate |
2004-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70d21e61c5042e92466edd1905570fd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7732ff0d915c10e4ca9d7b6c663c7c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e03adf20017894ae3b880de5100b0089
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58addf5041df9e113d3cbbabc7acd407 |
| publicationDate |
2004-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1462538-A1 |
| titleOfInvention |
Reactive mangnetron sputtering method |
| abstract |
The invention relates to a method for the reactive deposition of layers of chemical compounds by magnetron sputtering on substrates which are guided past coating devices during the coating, in which at least two magnetron discharges are operated simultaneously, such that at least one of the magnetron discharges an impedance greater than Z S and at least one of the magnetron discharges has an impedance less than Z S , where Z S is the impedance of a reactively operated magnetron discharge that must be set for the deposition of a layer of the desired chemical composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012072640-A1 |
| priorityDate |
2003-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |