| abstract |
New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge,nZr, Sn) and photoimageable compositions that contain such polymers. Preferrednpolymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s).nParticularly preferred are polymers that comprise SiO 2 or TiO 2 repeat units and whichncan be highly useful as a resin component of resists imaged at short wavelengths such asnsub-300 nm and sub-200 nm. |