| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8381805eba6d034fc77bd230dd02e6e2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-3154
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2931
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2929
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2936
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31906
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31855 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00 |
| filingDate |
2002-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_685cef9f791ba3074cf5af58f2d73f76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2064a852a32dbe3ebe73311a8fc639cc |
| publicationDate |
2004-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1448807-A1 |
| titleOfInvention |
Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition |
| abstract |
Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state ?29Si, 19F, and 13¿C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF¿2? groups as repeat units. |
| priorityDate |
2001-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |