| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_242cc8d15c771395b920cc7de452da6a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-515
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-515
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-04 |
| filingDate |
2004-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fe5efe4c42606f7a2ce7a1be4be1a19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_426393b4c0876a97d3cb381cf86e4b0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7473073dadbeac4aea2675cd36898ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d68dd74c0090fab987a546dfe948ccf5 |
| publicationDate |
2004-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1447459-A2 |
| titleOfInvention |
A method and system for producing thin films |
| abstract |
An object of the present invention is to form a thin film reproduciblynin a process for forming the thin film on the inner wall surface facing a spacenformed in a substrate by plasma CVD. A thin film 22 is produced on an innernwall surface 20b of a substrate 20 facing a space 23 formed in the substrate 20.nThe substrate 20 is contained in a chamber for plasma CVD process. A gas fornplasma reaction is then flown into the space 23 and a pulse voltage is applied onnthe substrate 20 without substantially applying a direct bias voltage on thensubstrate 20 to form the thin film on the inner wall surface 20b. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10912714-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9764093-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9903782-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10189603-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9664626-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9937099-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9863042-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11077233-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2229466-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9662450-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9545360-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CH-710472-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11724860-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11344473-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112251733-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11066745-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11406765-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11684546-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11624115-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10390744-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11148856-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11298293-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10363370-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10577154-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10201660-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9458536-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11123491-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10016338-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10537273-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11116695-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9554968-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9878101-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9272095-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10537494-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9572526-B2 |
| priorityDate |
2003-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |