| abstract |
The present invention provides a composition fornpreparing porous dielectric thin film containing pore-generatingnmaterial, said composition comprising geminindetergent, fourth alkylammonate, thermo-stable organic orninorganic matrix precursor, and solvent for dissolving saidntwo solid components. There is also provided an interlayerninsulating film having good mechanical property such asnhardness, modulus and hydroscopicity, which is required fornsemiconductor devices. |