Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa67eb74ea5b96d9f8f2cfdb3b025770 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61P31-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
filingDate |
2003-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07ccc0ea1a395f3eda59dbce2f688115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5d01438ff8505736d88ed1871dbc7eb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17a2a4e7c8764a0e969bbd8835dfd70a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a62d17acc1100f9212645732391b84a |
publicationDate |
2004-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1428907-A1 |
titleOfInvention |
Thermal activation of gas for use in a semiconductor process chamber |
abstract |
A method and system for thermally activating a oxidizing cleaning gas for use in ansemiconductor process chamber cleaning process. The oxidizing cleaning gas is thermallynactivated by reacting the oxidizing cleaning gas with heated inert gas. The resultingnthermally activated oxidizing cleaning gas does not readily deactivate, thus providingnenhanced cleaning capabilities. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9991095-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1788120-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8278222-B2 |
priorityDate |
2002-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |