| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069302aee0d7eee291cd1e0ffa662781
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb4ee28d43b5e8d4a3c5141fa9bcfeb0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0278
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0279 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0278
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0279
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
2002-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06fe6d84546a9b5221e99378e9662dab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44bb8d95a82569d5693f086dc2427906
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_302d2bebd0ae64c9b414c9600a9df076
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4492990ccc6b35ace18159339937c2a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4496d850ef8bfbdf40d49c7c57a5fdbb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67ffe342e12fdc179a973d1bba742d75 |
| publicationDate |
2004-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1413927-A1 |
| titleOfInvention |
Method for forming fine pattern |
| abstract |
There is provided a method of forming a fine resist pattern in which a highly practicable photosensitive composition obtained from a material having a high transparency against an exposure light having a short wavelength such as F 2 excimer laser beam is used as a resist. The method of forming a fine resist pattern comprises, in order, a step for forming a photosensitive layer on a substrate or on a given layer on the substrate using a photosensitive composition comprising at least a compound generating an acid by irradiation of light and a fluorine-containing polymer comprising a norbornene derivative unit having OH group or a functional group which can be converted to OH group by an acid, a step for exposing by selectively irradiating the given area of said photosensitive layer with energy ray, a step for heat-treating the exposed photosensitive layer, and a step for forming a fine pattern by developing the heat-treated photosensitive layer to selectively remove an exposed portion or an un-exposed portion of the photosensitive layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7186773-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9341949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7649118-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9696623-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014176490-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1415974-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1505439-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8252508-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1415974-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7867697-B2 |
| priorityDate |
2001-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |