http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1398648-A3
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01T1-2002 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01T1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61B6-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01T1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14 |
filingDate | 2003-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_583b1d705b089a17911ed421efe1f795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eadfb074b0f6eb9ab8930bf3e73a417a |
publicationDate | 2007-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-1398648-A3 |
titleOfInvention | Radiation converting substrate, radiation image pickup apparatus and radiation image pickup system |
abstract | The invention is to prevent an interlayer cleavage between a phosphor layer and a moisture-preventing protective layer. n In a radiation converting substrate constituted by forming at least a phosphor layer 12 composed of an alkali halide for converting a radiation into light and a light emission activator, and a moisture-preventing protective layer in succession on a radiation-transmitting substrate 11, the moisture-preventing protective layer is constituted of a first plasma polymerization film 13 formed from a monomer of a silane compound, and a second plasma polymerization film 14 formed from a monomer of a fluorine-containing unsaturated hydrocarbon. A radiation image pickup apparatus is formed by adhering such radiation converting substrate and a sensor substrate having a photoelectric converting element. |
priorityDate | 2002-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.